Ascent AMS

Application
Dual-magnetron sputtering, output configurations over 100 kW

Description
As manufacturing techniques advance, new materials and cathode designs pose greater challenges to process stability and film repeatability. Ascent® AMS power supplies deliver stable, repeatable power, regardless of process material or cathode design. The AMS provides advanced arc management, allowing maximum power delivery with faster recovery to process. Extreme fast recovery also means extremely low energy delivered through arcs, preventing substrate damage. For high power applications, the Ascent AMS can be used in primary/secondary configuration. Common applications include output configurations over 100 kW. However, the combined water/air cooling design keeps the generator footprint to a minimum. Benefits: - Obtain high film quality and throughput - Reduce film, substrate, and equipment damage - Achieve stable throughput and power delivery under extreme arcing conditions - Easily integrate and control Features: - Arc Management System™ (AMS) technology — customer pre-sets for metal and ceramic targets - Set Point Compensation™ technology - Arc Sync® technology — primary/secondary up to 12 units - Ethernet, EtherCAT®, DeviceNet®, Profibus, RS-232/485, Ethernet/IP, and analog communications

Product Properties

AC Input Voltage

400, 440, and 480 VAC

Output Power

30, 40, and 60

Ignition Voltage

800 to 1200 V

Output Voltage (30 kW)

300 to 1000 VDC

Output Voltage (40 kW)

333 to 1000 VDC

Available I/O

Ethernet, EtherCAT®, DeviceNet®, Profibus, RS-232/485, EtherNet/IP, and analog communications

Mounting

48.26 cm (19”), rack mountable, 6U height

Cooling method

Air and water combined

Unit
-

Currency
-

Value
-

Listing Type
Product

Published
May 30, 2021

Last Edited
May 30, 2021

Categories
Electrical

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